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Calling the adventurers ready to join a company that's pushing the limits of nanotechnology to keep the digital revolution rolling. At KLA, we're making technology advancements that are bigger—and tinier—than the world has ever seen.
Who are we? We research, develop, and manufacture the world's most advanced inspection and measurement equipment for the semiconductor and nanoelectronics industries. We enable the digital age by pushing the boundaries of technology, creating tools capable of finding defects smaller than a wavelength of visible light. We create smarter processes so that technology leaders can manufacture high-performance chips—the kind in that phone in your pocket, the tablet on your desk and nearly every electronic device you own—faster and better. We're passionate about creating solutions that drive progress and help people do what wouldn't be possible without us. The future is calling. Will you answer?
With over 40 years of semiconductor process control experience, chipmakers around the globe rely on KLA to ensure that their fabs ramp next-generation devices to volume production quickly and cost-effectively. Enabling the movement towards advanced chip design, KLA's Global Products Group (GPG), which is responsible for creating all of KLA’s metrology and inspection products, is looking for the best and the brightest research scientist, software engineers, application development engineers, and senior product technology process engineers.
The Broadband Plasma Division (BBP) provides market-leading patterned wafer optical inspection systems for leading-edge IC manufacturing. Logic, foundry, and memory customers depend on BBP products to detect yield-critical defects for process debug and excursion monitoring at advanced process nodes.
BBP flagship products include the 29xx and 39xx series which leverage Broadband Plasma technology to capture a wide range of defects with ultimate sensitivity at the optical inspection speeds needed for inline defect monitoring.
Seeking an intern to develop algorithms and study the effect of match filters on defect detection in terms of improving detectability of defect of interest and suppressing signal from nuisance events. A shallow deep learning network will be carefully constructed by providing examples of defect of interest and nuisance events. Once DL network has converged, the convolution filter from convolution layers will be extracted and analysis will be performed to determine which filter is activating what type of defects. Defect detection code will be modified to accommodate application of multiple filters. Eventually defect/nuisance SNR and capture rate will be analyzed to understand the effect of these filters. This work requires in depth understanding of DL networks and exceptional ability to hack/modify existing C/C++ code to accommodate new features. Above all in-depth data analysis skills and ability to work with a team are must needed qualities.
Ph.D Candidate in Physics, EE, CS
Equal Employment Opportunity
KLA is an Equal Opportunity Employer. Applicants will be considered for employment without regard to age, race, color, religion, sex, sexual orientation, gender identity, national origin, protected veteran status, disability, or any other characteristics protected by applicable law.