Calling the adventurers ready to join a company that's pushing the limits of nanotechnology to keep the digital revolution rolling. At KLA, we're making technology advancements that are bigger—and tinier—than the world has ever seen.
Who are we? We research, develop, and manufacture the world's most advanced inspection and measurement equipment for the semiconductor and nanoelectronics industries. We enable the digital age by pushing the boundaries of technology, creating tools capable of finding defects smaller than a wavelength of visible light. We create smarter processes so that technology leaders can manufacture high-performance chips—the kind in that phone in your pocket, the tablet on your desk and nearly every electronic device you own—faster and better. We're passionate about creating solutions that drive progress and help people do what wouldn't be possible without us. The future is calling. Will you answer?
Enabling the movement toward advanced chip design, KLA's Measurement, Analytics and Control group (MACH) is looking for the best and brightest research scientists, software engineers, application development engineers and senior product technology process engineers to join our team.
The MACH team's mission is to collaborate with our customers to innovate technologies and solutions that detect and control highly complex process variations—at their source—rather than compensate for them at later stages of the manufacturing process.
With over 40 years of semiconductor process control experience, chipmakers around the globe rely on KLA to ensure that their fabs ramp next-generation devices to volume production quickly and cost-effectively. Our MACH team develops leading-edge solutions for patterning process analytics and control technologies, thereby providing customers with critical insight at the feature level, field level and cross-wafer analysis. Our teams also develop advanced modeling simulation, data analytics and process control modeling technologies.
As a member of the MACH team, you’ll be joining the most sophisticated and successful process-control company in the semiconductor industry--working across functions to solve the most complex technical problems in the digital age.
In this position, you will have several responsibilities. First, work on a team to develop new models for lithography and etch patterning processing and to develop numerical algorithms to implement these models in commercial software. Second, work with customers to develop and to support new applications for computational patterning, working both on mask layout and fab use-cases. Potential applications include rigorous OPC (optical proximity correction), weak point analysis, and control and optimization of new patterning schemes. Third, work with advanced algorithms to greatly accelerate existing models on parallel compute and GPU platforms. Finally, work with advanced data analysis to determine model parameters by fitting to experimental datasets, which will include image-based metrology such as SEM images.
A proven innovative track record in the related fields of algorithm development, computational physics, and machine learning.
Background in computational physics or applied mathematics solving problems in areas such as fluid mechanics, imaging science, Maxwell equations, plasma chemistry and dynamics, surface evolution, and inverse problems. Or, a background in machine learning algorithms, such as machine vision and neural networks.
With the following experiences/Skills:
• Designing, developing, modifying and diagnosing complex algorithms
• Ability to invent, develop and implement new algorithms and ideas
• Hands-on experience in object-oriented and functional programming
• Hands-on experience with products such as Matlab, Python/TensorFlow is a plus
• Excellent written and verbal communication skills.
• Ability to work both independently and in a team environment.
Equal Employment Opportunity
KLA is an Equal Opportunity Employer. Applicants will be considered for employment without regard to age, race, color, religion, sex, sexual orientation, gender identity, national origin, protected veteran status, disability, or any other characteristics protected by applicable law.