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Calling the adventurers ready to join a company that's pushing the limits of nanotechnology to keep the digital revolution rolling. At KLA-Tencor, we're making technology advancements that are bigger—and tinier—than the world has ever seen.
Who are we? We research, develop, and manufacture the world's most advanced inspection and measurement equipment for the semiconductor and nanoelectronics industries. We enable the digital age by pushing the boundaries of technology, creating tools capable of finding defects smaller than a wavelength of visible light. We create smarter processes so that technology leaders can manufacture high-performance chips—the kind in that phone in your pocket, the tablet on your desk and nearly every electronic device you own—faster and better. We're passionate about creating solutions that drive progress and help people do what wouldn't be possible without us. The future is calling. Will you answer?
The Film and Scatterometry Technology (FaST) Division provides industry leading metrology solutions for worldwide semiconductor IC manufacturers. The FaST Division portfolio of metrology products includes hardware and software solutions for optical film thickness, optical critical dimension (CD), composition, and resistivity measurement systems. These products are essential for the IC manufacturers as they provide critical metrology capabilities for the development and implementation of their advanced IC processes. The FaST division is committed to support our customers to achieve performance entitlement of our solution and we effectively partner with our customers from their early research and development phase to the high volume in-line manufacturing implementation specific for their process needs. The division consists of a global team located in US, Israel, China, and India.
We are seeking a highly talented individual for an algorithm engineer position in optical critical dimension (OCD) group of FaST product division, KLA-Tencor China. A successful candidate shall have demonstrated ability in scientific computing with strong working knowledge in nonlinear optimization, statistical data analysis, computational geometry, or computational electromagnetics (field theory). Knowledge of optical modeling, scatterometry and metrology is a big plus.
The candidate will be responsible for developing and improving algorithms, measurement capabilities, system optical models, and analysis tools for optical metrology applications. Tasks include: define future product development strategy, develop a problem statement, research into particular solutions, develop code, and test prototypes.
The position may have opportunity of global travelling to US headquarters to take training and collaboration, or travelling to major customers in modern Asia countries/regions within a short period each time to provide onsite technical support and interact with customers. The travel frequency would be expected to be less than 20%.
In addition, the candidate is expected to possess good oral and written skills to demonstrate his or her own thoughts, communicate with other engineers and applications, locally or internationally, on a daily basis.