Calling the adventurers ready to join a company that's pushing the limits of nanotechnology to keep the digital revolution rolling. At KLA-Tencor, we're making technology advancements that are bigger—and tinier—than the world has ever seen.
Who are we? We research, develop, and manufacture the world's most advanced inspection and measurement equipment for the semiconductor and nanoelectronics industries. We enable the digital age by pushing the boundaries of technology, creating tools capable of finding defects smaller than a wavelength of visible light. We create smarter processes so that technology leaders can manufacture high-performance chips—the kind in that phone in your pocket, the tablet on your desk and nearly every electronic device you own—faster and better. We're passionate about creating solutions that drive progress and help people do what wouldn't be possible without us. The future is calling. Will you answer?
The reticle decision center division (RDC) is hiring application engineers to work on the cutting edge next-generation photomask inspection product.
This individual will be part of our large team of applicatoin engineers specializing in near real-time control of best-in-class semiconductor equipment that keeps our clients at the forefront of the technology curve. The major functionalities of the application is to manage all aspects of inspection process, including loading photomask, managing user setup input, coordinating various subsystems to sequence through calibration and inspection steps, processing large volume of data to generate defect result, reviewing inspection result, unloading photomask, managing storage and retrieval of inspection results, and integrating reticle inspection equipment with customer semi-conductor factory automation system and providing an intuitive and seamless user interface experience for all the above
We are seeking a highly talented individual for an Algorithm engineer position in RDC.
The successful candidate will join a world-class team of Algorithm engineers to support advanced image processing algorithms used in next-generation photomask/reticle inspection. One major responsibility of the candidate is to analyze the complex system,
and provide right inspection result analysis solution to customer that is practical for use in production. In addition, the candidate is expected to possess good oral and written communications skills to interact with customers, locally or internationally, on a daily basis.
Ph.D. or Master Degree in EE/CS/Mathematics or related fields
Strong background in at least one of the following areas: image processing, computer vision, pattern recognition, and machine learning
Strong linear system optimization, linear algebra background
Excellent mathematical and analytical skills
Knowledge in optics, computer architecture, or numerical methods
Programming experiences in Linux/Unix environments
Experiences in Matlab or other prototyping languages
Ability to manage multiple tasks and prioritize work accordingly